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Citation: W. Conley et al., Developments in materials for 157nm photoresists, SOL ST TECH, 44(10), 2001, pp. 63

Authors: Brodsky, C Byers, J Conley, W Hung, R Yamada, S Patterson, K Somervell, M Trinque, B Tran, HV Cho, S Chiba, T Lin, SH Jamieson, A Johnson, H Vander Heyden, T Willson, CG

Citation: C. Brodsky et al., 157 nm resist materials: Progress report, J VAC SCI B, 18(6), 2000, pp. 3396-3401