Authors:
Fujimori, H
Ushiku, Y
Ihnuma, T
Kirino, Y
Matsushita, O
Citation: H. Fujimori et al., The interrelation between the morphology of oxide precipitates and the junction leakage current in Czochralski silicon crystals, J ELCHEM SO, 146(2), 1999, pp. 702-706