Authors:
PRUDON G
GAUTIER B
DUPUY JC
DUBOIS C
BONNEAU M
DELMAS K
VALLARD JP
BREMOND G
BRENIER R
Citation: G. Prudon et al., QUANTIFICATION OF GERMANIUM AND BORON IN HETEROSTRUCTURES SI SI1-XGEX/SI BY SIMS/, Thin solid films, 294(1-2), 1997, pp. 54-58
Citation: E. Ehret et al., INFLUENCE OF EXTENDED DEFECTS AND NATIVE IMPURITIES ON EXTERNAL GETTERING IN POLYCRYSTALLINE SILICON, Materials science & engineering. B, Solid-state materials for advanced technology, 34(2-3), 1995, pp. 210-215
Citation: C. Maddalonvinante et al., INFRARED STUDY OF THE EFFECT OF RAPID THERMAL ANNEALING, THERMAL DONOR FORMATION, AND HYDROGEN ON THE PRECIPITATION OF OXYGEN, Journal of the Electrochemical Society, 142(6), 1995, pp. 2071-2076
Citation: C. Maddalonvinante et al., ON THE ORIGIN OF INTERNAL GETTERING SUPPRESSION IN LOW-CARBON CZ SILICON BY RAPID THERMAL ANNEALING, Journal of the Electrochemical Society, 142(2), 1995, pp. 560-564
Citation: Jl. Autran et al., CHARGE-PUMPING STUDY OF RADIATION-INDUCED DEFECTS AT SI-SIO2 INTERFACE, Journal de physique. III, 4(9), 1994, pp. 1707-1721