Authors: SPEE CIMA LINDEN JL VANDERZOUWENASSINK EA TIMMER K VERBEEK F MEINEMA HA FRIGO DM VANDERVEN S

Citation: Cima. Spee et al., DEPOSITION OF TITANIUM NITRIDE THIN-FILMS AT LOW-TEMPERATURES BY CVD USING METALORGANIC AND ORGANOMETALLIC TITANIUM COMPOUNDS AS PRECURSORS, Journal de physique. IV, 3(C3), 1993, pp. 289-296