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Results:
1-7
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Results: 7
Authors:
KLOOTWIJK JH
VANKRANENBURG H
WEUSTHOF MHH
WOERLEE PH
WALLINGA H
Citation: Jh. Klootwijk et al., RTP ANNEALINGS FOR HIGH-QUALITY LPCVD INTERPOLYSILICON DIELECTRIC LAYERS, Microelectronics and reliability, 38(2), 1998, pp. 277-280
Authors:
VANKRANENBURG H
WOERLEE PH
Citation: H. Vankranenburg et Ph. Woerlee, INFLUENCE OF OVERPOLISH TIME ON THE PERFORMANCE OF W DAMASCENE TECHNOLOGY, Journal of the Electrochemical Society, 145(4), 1998, pp. 1285-1291
Authors:
VANKRANENBURG H
VANCORBACH HD
WOERLEE PH
LOHMEIER M
Citation: H. Vankranenburg et al., W-CMP FOR SUBMICRON INVERSE METALLIZATION, Microelectronic engineering, 33(1-4), 1997, pp. 241-248
Authors:
KLOOTWIJK JH
WEUSTHOF MHH
VANKRANENBURG H
WOERLEE PH
WALLINGA H
Citation: Jh. Klootwijk et al., IMPROVEMENTS OF DEPOSITED INTERPOLYSILICON DIELECTRIC CHARACTERISTICSWITH RTP N2O-ANNEAL, IEEE electron device letters, 17(7), 1996, pp. 358-359
Authors:
BIJLSMA SJ
VANKRANENBURG H
NIEUWESTEEG KJBM
PITT MG
VERWEIJ JF
Citation: Sj. Bijlsma et al., ELECTRICAL BREAKDOWN OF AMORPHOUS HYDROGENATED SILICON RICH SILICON-NITRIDE THIN-FILM DIODES, I.E.E.E. transactions on electron devices, 43(9), 1996, pp. 1592-1601
Authors:
VANKRANENBURG H
LODDER C
Citation: H. Vankranenburg et C. Lodder, TAILORING GROWTH AND LOCAL COMPOSITION BY OBLIQUE-INCIDENCE DEPOSITION - A REVIEW AND NEW EXPERIMENTAL-DATA, Materials science & engineering. R, Reports, 11(7), 1994, pp. 295-354
Authors:
LODDER JC
DEHAAN P
VANKRANENBURG H
Citation: Jc. Lodder et al., GIANT MAGNETORESISTANCE IN OBLIQUELY COEVAPORATED CO-AG FILMS, Journal of magnetism and magnetic materials, 128(1-2), 1993, pp. 219-228
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