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AN X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY OF POLY(METHYL METHACRYLATE) SURFACE-MODIFIED BY 193 NM LASER-RADIATION/
Authors:
VANSAARLOOS PP VERNON CF CHIRILA TV KLAUBER C
Citation:
Pp. Vansaarloos et al., AN X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY OF POLY(METHYL METHACRYLATE) SURFACE-MODIFIED BY 193 NM LASER-RADIATION/, Polymer bulletin, 33(3), 1994, pp. 331-338
Risultati:
1-1
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