Authors: NANVER LK VISSER CCG VANDENBOGAARD A

Citation: Lk. Nanver et al., CONTROLLING TRANSIENT ENHANCED DIFFUSION EFFECTS IN HIGH-FREQUENCY SI0.7GE0.3 HETEROJUNCTION BIPOLAR-TRANSISTORS WITH IMPLANTED EMITTERS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(3), 1998, pp. 1533-1537

Authors: ALKEMADE PFA JIANG ZX VISSER CCG RADELAAR S ARNOLDBIK WM

Citation: Pfa. Alkemade et al., ULTRAHIGH DEPTH RESOLUTION SECONDARY-ION MASS-SPECTROMETRY WITH SUB-KEV GRAZING O-2(+) BEAMS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(1), 1998, pp. 373-376

Authors: MAES JWH CARO J VISSER CCG ZIJLSTRA T VANDERDRIFT EWJM RADELAAR S TICHELAAR FD FAKKELDIJ EJM

Citation: Jwh. Maes et al., NOVEL POSTETCHING TREATMENT OF SMALL WINDOWS IN OXIDE FOR SELECTIVE EPITAXIAL-GROWTH, Applied physics letters, 70(8), 1997, pp. 973-975

Authors: GARDENIERS JGE TILMANS HAC VISSER CCG

Citation: Jge. Gardeniers et al., LPCVD SILICON-RICH SILICON-NITRIDE FILMS FOR APPLICATIONS IN MICROMECHANICS, STUDIED WITH STATISTICAL EXPERIMENTAL-DESIGN, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(5), 1996, pp. 2879-2892

Authors: COWERN NEB HUIZING HGA STOLK PA VISSER CCG DEKRUIF RCM LARSEN KK PRIVITERA V NANVER LK CRANS W

Citation: Neb. Cowern et al., TIME SCALES OF TRANSIENT ENHANCED DIFFUSION - FREE AND CLUSTERED INTERSTITIALS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 120(1-4), 1996, pp. 14-18

Authors: HUIZING HGA VISSER CCG COWERN NEB STOLK PA DEKRUIF RCM

Citation: Hga. Huizing et al., ULTRAFAST INTERSTITIAL INJECTION DURING TRANSIENT ENHANCED DIFFUSION OF BORON IN SILICON, Applied physics letters, 69(9), 1996, pp. 1211-1213