Authors:
HOFMANN D
ECKSTEIN R
KOLBL M
MAKAROV Y
MULLER SG
SCHMITT E
WINNACKER A
RUPP R
STEIN R
VOLKL J
Citation: D. Hofmann et al., SIC-BULK GROWTH BY PHYSICAL-VAPOR TRANSPORT AND ITS GLOBAL MODELING, Journal of crystal growth, 174(1-4), 1997, pp. 669-674
Citation: R. Rupp et al., FIRST RESULTS ON SILICON-CARBIDE VAPOR-PHASE EPITAXY GROWTH IN A NEW-TYPE OF VERTICAL LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION REACTOR, Journal of crystal growth, 146(1-4), 1995, pp. 37-41
Citation: D. Wolf et al., PREPARATION AND CHARACTERIZATION OF SEMIINSULATING 2-IN INP WAFERS HAVING A LOW FE CONTENT BY WAFER ANNEALING, Materials science & engineering. B, Solid-state materials for advanced technology, 28(1-3), 1994, pp. 115-119
Citation: H. Siethoff et al., THE YIELD-POINT OF IN-DOPED GAAS BETWEEN 500-DEGREES-C AND 900-DEGREES-C, Journal of applied physics, 74(1), 1993, pp. 153-158