Authors: KRAGLER K GUNTHER E LEUSCHNER R FALK G HAMMERSCHMIDT A VONSEGGEM H SAEMANNISCHENKO G

Citation: K. Kragler et al., SCANNING-TUNNELING-MICROSCOPY BASED LITHOGRAPHY EMPLOYING AMORPHOUS HYDROGENATED CARBON AS A HIGH-RESOLUTION RESIST MASK, Applied physics letters, 67(8), 1995, pp. 1163-1165