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Results:
1-9
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Results: 9
Authors:
VOUTSAS AT
Citation: At. Voutsas, ENHANCED GRAIN-GROWTH PHENOMENA IN EXCIMER-LASER ANNEALED MICROCRYSTALLINE SILICON FILMS, JPN J A P 1, 37(2), 1998, pp. 388-396
Authors:
VOUTSAS AT
HIBINO Y
PETHE R
DEMARAY E
Citation: At. Voutsas et al., STRUCTURE ENGINEERING FOR HILLOCK-FREE PURE ALUMINUM SPUTTER-DEPOSITION FOR GATE AND SOURCE LINE FABRICATION IN ACTIVE-MATRIX LIQUID-CRYSTAL DISPLAYS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(4), 1998, pp. 2668-2677
Authors:
MARMORSTEIN A
VOUTSAS AT
SOLANKI R
Citation: A. Marmorstein et al., A SYSTEMATIC STUDY AND OPTIMIZATION OF PARAMETERS AFFECTING GRAIN-SIZE AND SURFACE-ROUGHNESS IN EXCIMER-LASER ANNEALED POLYSILICON THIN-FILMS, Journal of applied physics, 82(9), 1997, pp. 4303-4309
Authors:
KOUVATSOS DN
VOUTSAS AT
HATALIS MK
Citation: Dn. Kouvatsos et al., HIGH-PERFORMANCE THIN-FILM TRANSISTORS IN LARGE GRAIN-SIZE POLYSILICON DEPOSITED BY THERMAL-DECOMPOSITION OF DISILANE, I.E.E.E. transactions on electron devices, 43(9), 1996, pp. 1399-1406
Authors:
VOUTSAS AT
HATALIS MK
BOYCE J
CHIANG A
Citation: At. Voutsas et al., RAMAN-SPECTROSCOPY OF AMORPHOUS AND MICROCRYSTALLINE SILICON FILMS DEPOSITED BY LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION, Journal of applied physics, 78(12), 1995, pp. 6999-7006
Authors:
VOUTSAS AT
HATALIS MK
Citation: At. Voutsas et Mk. Hatalis, STRUCTURAL CHARACTERISTICS OF AS-DEPOSITED AND CRYSTALLIZED MIXED-PHASE SILICON FILMS, Journal of electronic materials, 23(3), 1994, pp. 319-330
Authors:
VOUTSAS AT
HATALI SMK
Citation: At. Voutsas et Smk. Hatali, EXPERIMENTAL AND THEORETICAL-STUDY OF THE CRYSTALLIZATION OF CHEMICAL-VAPOR-DEPOSITED MIXED-PHASE SILICON FILMS, Journal of applied physics, 76(2), 1994, pp. 777-790
Authors:
ZLATANOS S
VOUTSAS AT
Citation: S. Zlatanos et At. Voutsas, DESIGN AND ECONOMICS OF A CHEMICAL-PLANT FOR THE PRODUCTION OF GLYCIDYLALKYLESTERS OF PHTHALIC-ACID, Fett, 95(4), 1993, pp. 155-158
Authors:
VOUTSAS AT
HATALIS MK
Citation: At. Voutsas et Mk. Hatalis, CRYSTALLIZED MIXED-PHASE SILICON FILMS FOR THIN-FILM TRANSISTORS ON GLASS SUBSTRATES, Applied physics letters, 63(11), 1993, pp. 1546-1548
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1-9
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