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Results: 1-8 |
Results: 8
Giant microwave photoresistance of two-dimensional electron gas
Authors: Ye, PD Engel, LW Tsui, DC Simmons, JA Wendt, JR Vawter, GA Reno, JL
Citation: Pd. Ye et al., Giant microwave photoresistance of two-dimensional electron gas, APPL PHYS L, 79(14), 2001, pp. 2193-2195
Fabrication of diffractive optical elements for an integrated compact optical microelectromechanical system laser scanner
Authors: Wendt, JR Krygowski, TW Vawter, GA Blum, O Sweatt, WC Warren, ME Reyes, D
Citation: Jr. Wendt et al., Fabrication of diffractive optical elements for an integrated compact optical microelectromechanical system laser scanner, J VAC SCI B, 18(6), 2000, pp. 3608-3611
Three-dimensional control of light in a two-dimensional photonic crystal slab
Authors: Chow, E Lin, SY Johnson, SG Villeneuve, PR Joannopoulos, JD Wendt, JR Vawter, GA Zubrzycki, W Hou, H Alleman, A
Citation: E. Chow et al., Three-dimensional control of light in a two-dimensional photonic crystal slab, NATURE, 407(6807), 2000, pp. 983-986
High-aspect-ratio nanophotonic components fabricated by Cl-2 reactive ion beam etching
Authors: Zubrzycki, WJ Vawter, GA Wendt, JR
Citation: Wj. Zubrzycki et al., High-aspect-ratio nanophotonic components fabricated by Cl-2 reactive ion beam etching, J VAC SCI B, 17(6), 1999, pp. 2740-2744
Reactive ion beam etching of GaAs and related compounds in an inductively coupled plasma of Cl-2-Ar mixture
Authors: Hahn, YB Lee, JW Vawter, GA Shul, RJ Abernathy, CR Hays, DC Lambers, ES Pearton, SJ
Citation: Yb. Hahn et al., Reactive ion beam etching of GaAs and related compounds in an inductively coupled plasma of Cl-2-Ar mixture, J VAC SCI B, 17(2), 1999, pp. 366-371
Optimization of blazed quantum-grid infrared photodetectors
Authors: Rokhinson, LP Chen, CJ Choi, KK Tsui, DC Vawter, GA Yan, L Jiang, M Tamir, T
Citation: Lp. Rokhinson et al., Optimization of blazed quantum-grid infrared photodetectors, APPL PHYS L, 75(23), 1999, pp. 3701-3703
Quantum grid infrared photodetectors
Authors: Rokhinson, LP Chen, CJ Tsui, DC Vawter, GA Choi, KK
Citation: Lp. Rokhinson et al., Quantum grid infrared photodetectors, APPL PHYS L, 74(5), 1999, pp. 759-761
Comparison of plasma etch techniques for III-V nitrides
Authors: Shul, RJ Vawter, GA Willison, CG Bridges, MM Lee, JW Pearton, SJ Abernathy, CR
Citation: Rj. Shul et al., Comparison of plasma etch techniques for III-V nitrides, SOL ST ELEC, 42(12), 1998, pp. 2259-2267
Risultati: 1-8 |