Authors:
Zianni, X
Velessiotis, D
Glezos, N
Trohidou, KN
Citation: X. Zianni et al., Application of the partial wave expansion method in 3-D low energy electron beam lithography simulation, MICROEL ENG, 57-8, 2001, pp. 297-302
Authors:
Glezos, N
Argitis, P
Velessiotis, D
Raptis, I
Hatzakis, M
Hudek, P
Kostic, I
Citation: N. Glezos et al., Aqueous base development and acid diffusion length optimization in negative epoxy resist for electron beam lithography, J VAC SCI B, 18(6), 2000, pp. 3431-3434
Authors:
Raptis, I
Velessiotis, D
Vasilopoulou, M
Argitis, P
Citation: I. Raptis et al., Development mechanism study by dissolution monitoring of positive methacrylate photoresists, MICROEL ENG, 53(1-4), 2000, pp. 489-492