AAAAAA

   
Results: 1-4 |
Results: 4

Authors: Hoffmann, PM Vermeir, IE Searson, PC
Citation: Pm. Hoffmann et al., Electrochemical etching of n-type silicon in fluoride solutions, J ELCHEM SO, 147(8), 2000, pp. 2999-3002

Authors: Hoffmann, PM Vermeir, IE Natarajan, A Searson, PC
Citation: Pm. Hoffmann et al., In situ scanning tunneling microscopy characterization of step bunching onmiscut Si(111) surfaces in fluoride solutions, J APPL PHYS, 85(3), 1999, pp. 1545-1549

Authors: Theuwis, A Vermeir, IE
Citation: A. Theuwis et Ie. Vermeir, On the selective etching of In0.53Ga0.47As and In0.72Ga0.28As0.61P0.39 vs.InP in alkaline K3Fe(CN)(6) solutions - An electrochemical study, J ELCHEM SO, 146(3), 1999, pp. 1172-1180

Authors: Vermeir, IE Kim, NY Laibinis, PE
Citation: Ie. Vermeir et al., Electrical properties of covalently linked silicon polypyrrole junctions, APPL PHYS L, 74(25), 1999, pp. 3860-3862
Risultati: 1-4 |