Authors: Viana, CE da Silva, ANR Morimoto, NI Bonnaud, O

Citation: Ce. Viana et al., Analysis of SiO2 thin films deposited by PECVD using an oxygen-TEOS-argon mixture, BRAZ J PHYS, 31(2), 2001, pp. 299-303

Authors: Viana, CE Morimoto, NI Bonnaud, O

Citation: Ce. Viana et al., Annealing effects in the PECVD SiO2 thin films deposited using TEOS, Ar and O-2 mixture, MICROEL REL, 40(4-5), 2000, pp. 613-616