Authors: Vitale, SA Chae, H Sawin, HH

Citation: Sa. Vitale et al., Silicon etching yields in F-2, Cl-2, Br-2, and HBr high density plasmas, J VAC SCI A, 19(5), 2001, pp. 2197-2206

Authors: Vitale, SA Chae, H Sawin, HH

Citation: Sa. Vitale et al., Etching chemistry of benzocyclobutene (BCB) low-k dielectric films in F-2+O-2 and Cl-2+O-2 high density plasmas, J VAC SCI A, 18(6), 2000, pp. 2770-2778

Authors: Vitale, SA Sawin, HH

Citation: Sa. Vitale et Hh. Sawin, Abatement of C2F6 in rf and microwave plasma reactors, J VAC SCI A, 18(5), 2000, pp. 2217-2223

Authors: Ettinger, AB Weisbrot, DM Nolan, EE Gadow, KD Vitale, SA Andriola, MR Nowak, GP Hermann, BP

Citation: Ab. Ettinger et al., Untitled - Reply, EPILEPSIA, 40(4), 1999, pp. 530-531