Authors:
Jalabert, L
Temple-Boyer, P
Sarrabayrouse, G
Cristiano, F
Colombeau, B
Voillot, F
Armand, C
Citation: L. Jalabert et al., Reduction of boron penetration through thin silicon oxide with a nitrogen doped silicon layer, MICROEL REL, 41(7), 2001, pp. 981-985