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Results:
1-4
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Results: 4
Effects of vacuum and inert gas annealing of ultrathin tantalum pentoxide films on Si(100)
Authors:
Mao, AY Son, KA White, JM Kwong, DL Roberts, DA Vrtis, RN
Citation:
Ay. Mao et al., Effects of vacuum and inert gas annealing of ultrathin tantalum pentoxide films on Si(100), J VAC SCI A, 17(3), 1999, pp. 954-960
Annealing ultra thin Ta2O5 films deposited on bare and nitrogen passivatedSi(100)
Authors:
Mao, AY Son, KA Hess, DA Brown, LA White, JM Kwong, DL Roberts, DA Vrtis, RN
Citation:
Ay. Mao et al., Annealing ultra thin Ta2O5 films deposited on bare and nitrogen passivatedSi(100), THIN SOL FI, 349(1-2), 1999, pp. 230-237
Kinetics of copper drift in low-kappa polymer interlevel dielectrics
Authors:
Loke, ALS Wetzel, JT Townsend, PH Tanabe, T Vrtis, RN Zussman, MP Kumar, D Ryu, C Wong, SS
Citation:
Als. Loke et al., Kinetics of copper drift in low-kappa polymer interlevel dielectrics, IEEE DEVICE, 46(11), 1999, pp. 2178-2187
Deposition and annealing of ultrathin Ta2O5 films on nitrogen passivated Si(100)
Authors:
Son, KA Mao, AY Hess, DA Brown, LA White, JM Kwong, DL Roberts, DA Vrtis, RN
Citation:
Ka. Son et al., Deposition and annealing of ultrathin Ta2O5 films on nitrogen passivated Si(100), EL SOLID ST, 1(4), 1998, pp. 178-180
Risultati:
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