Authors: WAKAMIYA W HIRAYAMA M YASUOKA A KAWAI A

Citation: W. Wakamiya et al., REFRACTIVE-INDEX DISTRIBUTION IN PHOTORESIST THIN-FILM FORMED BY THE SPIN-COATING METHOD, JPN J A P 2, 36(12A), 1997, pp. 1622-1624

Authors: WAKAMIYA W HIRAYAMA M YASUOKA A KAWAI A

Citation: W. Wakamiya et al., ADHESION IMPROVEMENT OF PHOTORESIST ON TIN AL MULTILAYER BY OZONE TREATMENT/, JPN J A P 2, 35(9B), 1996, pp. 1227-1229

Authors: MIYAZAKI J HANAWA T NAKAE A YOSHIOKA N WAKAMIYA W

Citation: J. Miyazaki et al., LITHOGRAPHIC CHARACTERISTICS OF AN ATTENUATED PHASE-SHIFTING MASK USING A SINGLE-LAYER ABSORPTIVE SHIFTER, Denki Kagaku Oyobi Kogyo Butsuri Kagaku, 63(6), 1995, pp. 499-504

Authors: MIYAZAKI J NAKAE A KUSUNOSE H YOSHIOKA N WAKAMIYA W MURAYAMA K

Citation: J. Miyazaki et al., EFFECT OF PHASE ERROR ON LITHOGRAPHIC CHARACTERISTICS USING ATTENUATED PHASE-SHIFTING MASK, JPN J A P 1, 33(12B), 1994, pp. 6785-6789

Authors: KAMON K MIYAMOTO T MYOI Y WAKAMIYA W NAGATA H TANAKA M

Citation: K. Kamon et al., PROPOSAL OF A NEXT-GENERATION SUPER RESOLUTION TECHNIQUE, JPN J A P 1, 33(12B), 1994, pp. 6848-6854