Authors: MISHIMA Y TAKEI M UEMATSU T MATSUMOTO N KAKEHI T WAKINO U OKABE M

Citation: Y. Mishima et al., POLYCRYSTALLINE SILICON FORMED BY ULTRAHIGH-VACUUM SPUTTERING SYSTEM, Journal of applied physics, 78(1), 1995, pp. 217-223

Authors: MISHIMA Y TAKEI M MATSUMOTO N UEMATSU T WAKINO U KAKEHI T OKABE M

Citation: Y. Mishima et al., EFFECT OF HYDROGEN-ION SHOWER DOPING IN POLYCRYSTALLINE SILICON THIN-FILM TRANSISTORS, Applied physics letters, 66(1), 1995, pp. 31-33