Authors: SHOGUN V TYABLIKOV A SCHREITER S SCHARFF W WALLENDORF T MARKE S

Citation: V. Shogun et al., EMISSION ACTINOMETRIC INVESTIGATIONS OF ATOMIC-HYDROGEN AND CH RADICALS IN PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION PROCESSES OF HEXAMETHYLDISILOXANE, Surface & coatings technology, 98(1-3), 1998, pp. 1382-1386

Authors: SHOGUN V TYABLIKOV A ABACHEV M PASHKOV V SCHARFF W WALLENDORF T

Citation: V. Shogun et al., AN EMISSION ACTINOMETRIC METHOD FOR MEASURING OF PLASMACHEMICAL REACTION KINETIC-PARAMETERS WITH DISCHARGE POWER MODULATION BY A SERIES OF SHORT PROBING PULSES, Surface & coatings technology, 98(1-3), 1998, pp. 1406-1410

Authors: VETTER J WALLENDORF T

Citation: J. Vetter et T. Wallendorf, PLASMA DIAGNOSTICS OF ARC-ENHANCED GLOW-DISCHARGE, Surface & coatings technology, 76(1-3), 1995, pp. 322-327

Authors: SHOGUN V TYABLIKOV A SHELYHMANOV E ABACHEV M SCHARFF W WALLENDORF T

Citation: V. Shogun et al., APPLICATION OF AN ACOUSTOOPTIC SPECTROMETER FOR PLASMA-ETCHING PROCESS QUALITY-CONTROL, Surface & coatings technology, 74-5(1-3), 1995, pp. 571-574

Authors: RICHTER F SCHAARSCHMIDT G FRANKE DW WALLENDORF T RAU B

Citation: F. Richter et al., ANALYSIS OF THE GROWTH-PROCESS OF A-C-H LAYERS, DIAMOND AND RELATED MATERIALS, 2(10), 1993, pp. 1344-1349

Authors: STENZEL O VOGEL M PONITZ S PETRICH R WALLENDORF T VONBORCZYSKOWSKI C ROZPLOCH F KRASILNIK Z KALUGIN N

Citation: O. Stenzel et al., THE EFFECT OF NITROGENATION ON THE ELECTRICAL-PROPERTIES OF AMORPHOUSHYDROGENATED CARBON LAYERS, Physica status solidi. a, Applied research, 140(1), 1993, pp. 179-188