Authors: CHEN IC RODDER M WANN HJ SPRATT D

Citation: Ic. Chen et al., PERFORMANCE AND RELIABILITY ENHANCEMENT FOR CVD TUNGSTEN POLYCIDED CMOS TRANSISTORS DUE TO FLUORINE INCORPORATION IN THE GATE OXIDE, IEEE electron device letters, 15(9), 1994, pp. 351-353

Authors: MA ZJ WANN HJ CHAN M KING JC CHENG YC KO PK HU C

Citation: Zj. Ma et al., HOT-CARRIER EFFECTS IN THIN-FILM FULLY DEPLETED SOI MOSFETS, IEEE electron device letters, 15(6), 1994, pp. 218-220