Authors: HICKS SE PARKES W WILKINSON JAH WILKINSON CDW

Citation: Se. Hicks et al., REFLECTANCE MODELING FOR IN-SITU DRY ETCH MONITORING OF BULK SIO2 ANDIII-V MULTILAYER STRUCTURES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3306-3310