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REACTIVE ION ETCHING (RIE) AS A METHOD FOR TEXTURING POLYCRYSTALLINE SILICON SOLAR-CELLS
Authors: WINDERBAUM S REINHOLD O YUN F
Citation: S. Winderbaum et al., REACTIVE ION ETCHING (RIE) AS A METHOD FOR TEXTURING POLYCRYSTALLINE SILICON SOLAR-CELLS, Solar energy materials and solar cells, 46(3), 1997, pp. 239-248
APPLICATION OF PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION SILICON-NITRIDE AS A DOUBLE-LAYER ANTIREFLECTION COATING AND PASSIVATION LAYER FORPOLYSILICON SOLAR-CELLS
Authors: WINDERBAUM S YUN F REINHOLD O
Citation: S. Winderbaum et al., APPLICATION OF PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION SILICON-NITRIDE AS A DOUBLE-LAYER ANTIREFLECTION COATING AND PASSIVATION LAYER FORPOLYSILICON SOLAR-CELLS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(3), 1997, pp. 1020-1025
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