Authors:
HORNG RH
WUU DS
CHAN SH
CHIANG MC
HUANG TY
SZE SM
Citation: Rh. Horng et al., RAPID-THERMAL-PROCESSED BATIO3 THIN-FILMS DEPOSITED BY LIQUID-SOURCE MISTED CHEMICAL-DEPOSITION, JPN J A P 1, 37(3A), 1998, pp. 885-888
Authors:
HORNG RH
WUU DS
WU LH
LEE MK
CHAN SH
LEU CC
HUANG TY
SZE SM
Citation: Rh. Horng et al., THERMAL-STABILITY OF CO-SPUTTERED RU-TI ALLOY ELECTRODES FOR DYNAMIC RANDOM-ACCESS MEMORY APPLICATIONS, JPN J A P 2, 37(10B), 1998, pp. 1247-1250
Citation: Cw. Wang et al., LUMINESCENCE IMPROVEMENT OF SRS-CE THIN-FILMS BY RAPID THERMAL ANNEALING - EVIDENCE OF ENERGY-TRANSFER MODEL FOR SRS-CE ELECTROLUMINESCENT DEVICES, Journal of applied physics, 83(12), 1998, pp. 7958-7964
Citation: Rh. Horng et al., CHARACTERIZATION OF THIN-FILM ELECTROLUMINESCENT DEVICES WITH MULTIPLE TA2O5 INTERLAYERS INCORPORATED INTO SRS-PR,CE PHOSPHOR, JPN J A P 1, 36(12A), 1997, pp. 7245-7249
Citation: Ds. Wuu et al., PLANARIZATION AND FABRICATION OF SACRIFICIAL MEMBRANES ACROSS DEEP GROOVES IN SILICON BY GLASS SOOT DEPOSITION, Journal of micromechanics and microengineering, 7(4), 1997, pp. 276-279
Citation: Rh. Horng et al., AN ELECTROLUMINESCENT DEVICE USING MULTIBARRIER Y2O3 LAYERS INCORPORATED INTO ZNS-MN PHOSPHOR LAYER, Materials chemistry and physics, 51(1), 1997, pp. 11-14
Citation: Rh. Horng et al., STRUCTURAL AND ELECTROLUMINESCENT CHARACTERISTICS OF SPUTTERED SRS-CETHIN-FILMS BY RAPID THERMAL-PROCESS, Thin solid films, 307(1-2), 1997, pp. 228-232
Citation: Rh. Horng et Ds. Wuu, THE EFFECTS OF RAPID THERMAL-PROCESS ON THE PROPERTIES OF SPUTTERED SRS-CEF3 THIN-FILMS, Journal of applied physics, 82(3), 1997, pp. 1363-1366
Citation: Ds. Wuu et al., CHARACTERIZATION OF HAFNIUM DIBORIDE THIN-FILM RESISTORS BY RF MAGNETRON SPUTTERING, Materials chemistry and physics, 45(2), 1996, pp. 163-166
Citation: Rh. Horng et al., REFRACTIVE-INDEX BEHAVIOR OF BORON-DOPED SILICA FILMS BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION, Applied surface science, 92, 1996, pp. 387-390
Citation: Rh. Horng et al., EFFECTS OF RAPID THERMAL-PROCESS ON STRUCTURAL AND ELECTRICAL CHARACTERISTICS OF Y2O3 THIN-FILMS BY RF-MAGNETRON SPUTTERING, Thin solid films, 289(1-2), 1996, pp. 234-237