Authors: LEE KY FANG YK CHEN CW YAUNG DN WUU KH HO JJ LIANG MS WUU SG

Citation: Ky. Lee et al., THE IMPACTS OF BACK-END HIGH-TEMPERATURE THERMAL TREATMENTS ON THE CHARACTERISTICS AND GATE OXIDE RELIABILITY OF THIN-FILM-TRANSISTOR IN ULTRA LARGE-SCALE INTEGRATED-CIRCUIT PROCESS, JPN J A P 1, 36(5A), 1997, pp. 2628-2632