Authors: Hinsberg, WD Houle, FA Sanchez, MI Wallraff, GM

Citation: Wd. Hinsberg et al., Chemical and physical aspects of the post-exposure baking process used forpositive-tone chemically amplified resists, IBM J RES, 45(5), 2001, pp. 667-682

Authors: Wallraff, GM Hinsberg, WD

Citation: Gm. Wallraff et Wd. Hinsberg, Lithographic imaging techniques for the formation of nanoscopic features, CHEM REV, 99(7), 1999, pp. 1801-1821