AAAAAA

   
Results: 1-7 |
Results: 7
Kinetic-energy-assisted He+-ion neutralization at a solid CO2 surface - art. no. 054901
Authors: Lancaster, JC Kontur, FJ Walters, GK Dunning, FB
Citation: Jc. Lancaster et al., Kinetic-energy-assisted He+-ion neutralization at a solid CO2 surface - art. no. 054901, PHYS REV A, 6405(5), 2001, pp. 4901
Patterning of octadecylsiloxane self-assembled monolayers on Si(100) usingAr(P-3(0,2)) atoms
Authors: Hill, SB Haich, CA Dunning, FB Walters, GK McClelland, JJ Celotta, RJ Craighead, HG Han, J Tanenbaum, DM
Citation: Sb. Hill et al., Patterning of octadecylsiloxane self-assembled monolayers on Si(100) usingAr(P-3(0,2)) atoms, J VAC SCI B, 17(3), 1999, pp. 1087-1089
Use of spin-labelling techniques to probe the dynamics of He+ ion neutralization at clean metal surfaces
Authors: Bixler, DL Lancaster, JC Kontur, FJ Nordlander, P Walters, GK Dunning, FB
Citation: Dl. Bixler et al., Use of spin-labelling techniques to probe the dynamics of He+ ion neutralization at clean metal surfaces, NUCL INST B, 157(1-4), 1999, pp. 68-74
Spin-dependent studies of the dynamics of He+ ion neutralization at a Au(100) surface
Authors: Bixler, DL Lancaster, JC Kontur, FJ Nordlander, P Walters, GK Dunning, FB
Citation: Dl. Bixler et al., Spin-dependent studies of the dynamics of He+ ion neutralization at a Au(100) surface, PHYS REV B, 60(12), 1999, pp. 9082-9089
Source of potential systematic error in retarding-potential Mott polarimeters
Authors: Lancaster, JC Kontur, FJ Walters, GK Dunning, FB
Citation: Jc. Lancaster et al., Source of potential systematic error in retarding-potential Mott polarimeters, REV SCI INS, 70(7), 1999, pp. 3186-3187
Improved low-energy, electron-spin-polarized He-4(+) ion source
Authors: Bixler, DL Lancaster, JC Kontur, FJ Popple, RA Dunning, FB Walters, GK
Citation: Dl. Bixler et al., Improved low-energy, electron-spin-polarized He-4(+) ion source, REV SCI INS, 70(1), 1999, pp. 240-241
Patterning of hydrogen-passivated Si(100) using Ar(P-3(0,2)) metastable atoms
Authors: Hill, SB Haich, CA Dunning, FB Walters, GK McClelland, JJ Celotta, RJ Craighead, HG
Citation: Sb. Hill et al., Patterning of hydrogen-passivated Si(100) using Ar(P-3(0,2)) metastable atoms, APPL PHYS L, 74(15), 1999, pp. 2239-2241
Risultati: 1-7 |