Authors: Stenkamp, D Kienzle, O Orchowski, A Rau, WD Weickenmeier, A Benner, G Wetzke, M Waskiewicz, W Katsap, V Zhu, X Liu, H Munro, E Rouse, JA

Citation: D. Stenkamp et al., Progress on the realization of the electron column modules for SCALPEL high-throughput/alpha electron projection lithography tools, MICROEL ENG, 57-8, 2001, pp. 137-143