AAAAAA

   
Results: 1-18 |
Results: 18
Characterisation of fulvic acids and glycyrrhizic acid by time-of-flight secondary ion mass spectrometry
Authors: Szymczak, W Wolf, M Wittmaack, K
Citation: W. Szymczak et al., Characterisation of fulvic acids and glycyrrhizic acid by time-of-flight secondary ion mass spectrometry, ACT HYDR HY, 28(7), 2001, pp. 350-358
Peak or centroid - which parameter is better suited for quantifying apparent marker locations in low-energy sputter depth profiling with reactive primary ion beams?
Authors: Wittmaack, K Hammerl, E Eisele, I Patel, SB
Citation: K. Wittmaack et al., Peak or centroid - which parameter is better suited for quantifying apparent marker locations in low-energy sputter depth profiling with reactive primary ion beams?, SURF INT AN, 31(9), 2001, pp. 893-896
Influence of the depth calibration procedure on the apparent shift of impurity depth profiles measured under conditions of long-term changes in erosion rate
Authors: Wittmaack, K
Citation: K. Wittmaack, Influence of the depth calibration procedure on the apparent shift of impurity depth profiles measured under conditions of long-term changes in erosion rate, J VAC SCI B, 18(1), 2000, pp. 1-6
In search of optimum conditions for the growth of sharp and shallow B-delta markers in Si by molecular beam epitaxy
Authors: Wittmaack, K Griesche, J Osten, HJ Patel, SB
Citation: K. Wittmaack et al., In search of optimum conditions for the growth of sharp and shallow B-delta markers in Si by molecular beam epitaxy, J VAC SCI B, 18(1), 2000, pp. 524-528
Time-of-flight secondary ion mass spectrometry of matrix-diluted oligo- and polypeptides bombarded with slow and fast projectiles: Positive and negative matrix and analyte ion yields, background signals, and sample aging
Authors: Wittmaack, K Szymczak, W Hoheisel, G Tuszynski, W
Citation: K. Wittmaack et al., Time-of-flight secondary ion mass spectrometry of matrix-diluted oligo- and polypeptides bombarded with slow and fast projectiles: Positive and negative matrix and analyte ion yields, background signals, and sample aging, J AM SOC M, 11(6), 2000, pp. 553-563
Incorporation of chlorine in polymer films due to MeV proton bombardment
Authors: Menzel, N Wittmaack, K
Citation: N. Menzel et K. Wittmaack, Incorporation of chlorine in polymer films due to MeV proton bombardment, NUCL INST B, 166, 2000, pp. 632-636
Thickness uniformity of beryllium foils derived from energy loss broadening of transmitted MeV protons
Authors: Hietel, B Wittmaack, K
Citation: B. Hietel et K. Wittmaack, Thickness uniformity of beryllium foils derived from energy loss broadening of transmitted MeV protons, NUCL INST B, 161, 2000, pp. 563-567
Optimisation of peak-to-background ratios in proton-induced X-ray analysisof material deposited on thin and thick backings
Authors: Wittmaack, K Hietel, B
Citation: K. Wittmaack et B. Hietel, Optimisation of peak-to-background ratios in proton-induced X-ray analysisof material deposited on thin and thick backings, NUCL INST B, 161, 2000, pp. 814-818
Surface recession of silicon under normally incident oxygen bombardment studied by atomic force microscopy of microscale sputtered craters
Authors: Wittmaack, K Strigl, M Horwarth, A
Citation: K. Wittmaack et al., Surface recession of silicon under normally incident oxygen bombardment studied by atomic force microscopy of microscale sputtered craters, SURF INT AN, 29(10), 2000, pp. 717-720
Local SiO2 formation in silicon bombarded with oxygen above the critical angle for beam-induced oxidation: new evidence from sputtering yield ratios and correlation with data obtained by other techniques
Authors: Wittmaack, K
Citation: K. Wittmaack, Local SiO2 formation in silicon bombarded with oxygen above the critical angle for beam-induced oxidation: new evidence from sputtering yield ratios and correlation with data obtained by other techniques, SURF INT AN, 29(10), 2000, pp. 721-725
Reply to the 'Comment on "The 'infinite velocity method': a means of concentration calibration in secondary ion mass spectrometry?'" [Surf. Sci. 429 (1999) 84]
Authors: Wittmaack, K
Citation: K. Wittmaack, Reply to the 'Comment on "The 'infinite velocity method': a means of concentration calibration in secondary ion mass spectrometry?'" [Surf. Sci. 429 (1999) 84], SURF SCI, 453(1-3), 2000, pp. L332-L335
A new analysis chamber with a rotating target holder for total-sample PIXEanalysis of aerosol deposits collected in Berner impactors
Authors: Halder, H Menzel, N Hietel, B Wittmaack, K
Citation: H. Halder et al., A new analysis chamber with a rotating target holder for total-sample PIXEanalysis of aerosol deposits collected in Berner impactors, NUCL INST B, 150(1-4), 1999, pp. 90-95
A spray technique for preparing uniform large-area PIXE calibration standards from aqueous solutions
Authors: Menzel, N Hietel, B Leirer, M Szymczak, W Wittmaack, K
Citation: N. Menzel et al., A spray technique for preparing uniform large-area PIXE calibration standards from aqueous solutions, NUCL INST B, 150(1-4), 1999, pp. 96-102
Influence of alloying on the electron momentum density in the Cu-Ni system
Authors: Metz, C Tschentscher, T Sattler, T Hoppner, K Schneider, JR Wittmaack, K Frischke, D Bell, F
Citation: C. Metz et al., Influence of alloying on the electron momentum density in the Cu-Ni system, PHYS REV B, 60(20), 1999, pp. 14049-14056
The 'infinite velocity method': a means of concentration calibration in secondary ion mass spectrometry?
Authors: Wittmaack, K
Citation: K. Wittmaack, The 'infinite velocity method': a means of concentration calibration in secondary ion mass spectrometry?, SURF SCI, 429(1-3), 1999, pp. 84-101
Ion-induced electron emission as a means of studying energy- and angle-dependent compositional changes of solids bombarded with reactive ions - II. Nitrogen bombardment of silicon
Authors: Kataoka, Y Wittmaack, K
Citation: Y. Kataoka et K. Wittmaack, Ion-induced electron emission as a means of studying energy- and angle-dependent compositional changes of solids bombarded with reactive ions - II. Nitrogen bombardment of silicon, SURF SCI, 424(2-3), 1999, pp. 299-310
Ion-induced electron emission as a means of studying energy- and angle-dependent compositional changes of solids bombarded with reactive ions - I. Oxygen bombardment of silicon
Authors: Wittmaack, K
Citation: K. Wittmaack, Ion-induced electron emission as a means of studying energy- and angle-dependent compositional changes of solids bombarded with reactive ions - I. Oxygen bombardment of silicon, SURF SCI, 419(2-3), 1999, pp. 249-264
Dose calibration for through-oxide doping distributions from time-dependent secondary-ion-mass-spectrometry depth profiles with only one sensitivity factor
Authors: Wittmaack, K Lee, JJ Patel, SB
Citation: K. Wittmaack et al., Dose calibration for through-oxide doping distributions from time-dependent secondary-ion-mass-spectrometry depth profiles with only one sensitivity factor, APPL PHYS L, 74(26), 1999, pp. 3969-3971
Risultati: 1-18 |