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Citation: M. Esser et al., Breakdown of the simple kinematic approximation models in high-resolution LEED characterization of the initial growth of Si/Si(111), SURF SCI, 482, 2001, pp. 1355-1361

Authors: Benes, NE Spijksma, G Verweij, H Wormeester, H Poelsema, B

Citation: Ne. Benes et al., CO2 sorption of a thin silica layer determined by spectroscopic ellipsometry, AICHE J, 47(5), 2001, pp. 1212-1218

Authors: Groenewoud, LMH Engbers, GHM Terlingen, JGA Wormeester, H Feijen, J

Citation: Lmh. Groenewoud et al., Pulsed plasma polymerization of thiophene, LANGMUIR, 16(15), 2000, pp. 6278-6286

Authors: Lohner, T Fried, M Khanh, NQ Petrik, P Wormeester, H El-Sherbiny, MA

Citation: T. Lohner et al., Comparative study of ion implantation caused anomalous surface damage in silicon studied by spectroscopic ellipsometry and Rutherford backscattering spectrometry, NUCL INST B, 147(1-4), 1999, pp. 90-95

Authors: Hueger, E Wormeester, H Bauer, E

Citation: E. Hueger et al., Hexagonal metal modifications and thin-film ferromagnetism, SURF SCI, 438(1-3), 1999, pp. 185-190

Authors: Span, EAF Wormeester, H Blank, DHA Rogalla, H

Citation: Eaf. Span et al., Oxygen diffusion in laser-ablated YBa2Cu3Ox thin films studied by spectroscopic ellipsometry, MAT SCI E B, 56(2-3), 1998, pp. 123-129