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Results: 2
Correction of the field curvature in SCALPEL projection systems
Authors: Xiu, K Gibson, JM
Citation: K. Xiu et Jm. Gibson, Correction of the field curvature in SCALPEL projection systems, J VAC SCI B, 18(6), 2000, pp. 3067-3071
Optimized design for the scattering with angular limitation in projection electron-beam lithography based electron projection system
Authors: Xiu, K Gibson, JM
Citation: K. Xiu et Jm. Gibson, Optimized design for the scattering with angular limitation in projection electron-beam lithography based electron projection system, J VAC SCI B, 18(3), 2000, pp. 1299-1305
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