Citation: Cf. Yeh et al., CHARACTERISTICS OF SELF-INDUCED LIGHTLY-DOPED-DRAIN POLYCRYSTALLINE SILICON THIN-FILM TRANSISTORS WITH LIQUID-PHASE DEPOSITION SIO2 AS GATE-INSULATOR AND PASSIVATION-LAYER, I.E.E.E. transactions on electron devices, 42(2), 1995, pp. 307-314
Authors:
YEH CF
CHEN CL
YANG YC
LIN SS
YANG TZ
HONG TY
Citation: Cf. Yeh et al., LOW-TEMPERATURE-PROCESSED POLY-SI THIN-FILM TRANSISTORS USING SOLID-PHASE-CRYSTALLIZED AND LIQUID-PHASE-DEPOSITED GATE OXIDE, JPN J A P 1, 33(4A), 1994, pp. 1798-1802
Citation: Cf. Yeh et al., PERFORMANCE AND OFF-STATE CURRENT MECHANISMS OF LOW-TEMPERATURE PROCESSED POLYSILICON THIN-FILM TRANSISTORS WITH LIQUID-PHASE DEPOSITED SIO2 GATE INSULATOR, I.E.E.E. transactions on electron devices, 41(2), 1994, pp. 173-179
Citation: Cf. Yeh et al., EXPERIMENTAL COMPARISON OF OFF-STATE CURRENT BETWEEN HIGH-TEMPERATURE-PROCESSED AND LOW-TEMPERATURE-PROCESSED UNDOPED CHANNEL POLYSILICON THIN-FILM TRANSISTORS, JPN J A P 1, 32(10), 1993, pp. 4472-4478