Authors: ALLEN LR YUWANG V SATO M

Citation: Lr. Allen et al., SELECTIVE DRY-ETCHING OF OXIDE-FILMS FOR SPACER APPLICATIONS IN A HIGH-DENSITY PLASMA, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3470-3472

Authors: WESTERHEIM AC LABUN AH DUBASH JH ARNOLD JC SAWIN HH YUWANG V

Citation: Ac. Westerheim et al., SUBSTRATE BIAS EFFECTS IN HIGH-ASPECT-RATIO SIO2 CONTACT ETCHING USING AN INDUCTIVELY-COUPLED PLASMA REACTOR, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(3), 1995, pp. 853-858