Authors:
Tanuma, N
Yasukawa, S
Yokokura, S
Hashiguchi, S
Sikula, J
Matsui, T
Tacano, M
Citation: N. Tanuma et al., Electron cyclotron resonance plasma etching of n-SiC and evaluation of Ni/n-SiC contacts by current noise measurements, JPN J A P 1, 40(6A), 2001, pp. 3979-3984
Authors:
Kawano, R
Yamanaka, N
Oki, E
Yasukawa, S
Okazaki, K
Ohki, A
Usui, M
Sato, N
Katsura, K
Ando, Y
Kagawa, T
Hikita, M
Citation: R. Kawano et al., A 100-Gb/s throughput ATM switch MCM with a 320-channel parallel optical I/O interface, IEEE T AD P, 24(1), 2001, pp. 91-98
Authors:
Yamanaka, N
Oki, E
Yasukawa, S
Kawano, R
Okazaki, K
Citation: N. Yamanaka et al., OPTIMA: Scalable, multi-stage, 640-Gbit/s ATM switching system based on advanced electronic and optical WDM technologies, IEICE TR CO, E83B(7), 2000, pp. 1488-1496
Citation: S. Yasukawa et al., High-speed multi-stage ATM switch based on hierarchical cell resequencing architecture and WDM interconnection, IEICE TR EL, E82C(2), 1999, pp. 219-228
Citation: S. Yasukawa et al., High-speed multi-stage ATM switch based on hierarchical cell resequencing architecture and WDM interconnection, IEICE TR CO, E82B(2), 1999, pp. 271-280