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Results: 2
Use of microfabricated cold field emitters in sub-100 nm maskless lithography
Authors: Gu, GX Tokunaga, K Yin, E Tsai, FC Brodie, AD Parker, NW
Citation: Gx. Gu et al., Use of microfabricated cold field emitters in sub-100 nm maskless lithography, J VAC SCI B, 19(3), 2001, pp. 862-865
Electron optical column for a multicolumn, multibeam direct-write electronbeam lithography system
Authors: Yin, E Brodie, AD Tsai, FC Guo, GX Parker, NW
Citation: E. Yin et al., Electron optical column for a multicolumn, multibeam direct-write electronbeam lithography system, J VAC SCI B, 18(6), 2000, pp. 3126-3131
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