Authors:
Rusli,"Yoon, SF
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Osipowicz, T
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Authors:
Yoon, SF
Tan, KH",Rusli,"Ahn, J
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Citation: Sf. Yoon et al., Comparative study on the effects of ion density and ion energy on diamond-like carbon deposited by electron cyclotron resonance chemical vapor deposition, J APPL PHYS, 89(9), 2001, pp. 4830-4835
Authors:
Gan, B
Ahn, J",Rusli,"Zhang, Q
Yoon, SF
Ligatchev, VA
Yu, J
Chew, K
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Citation: B. Gan et al., Thickness dependence of density of gap states in diamond films studied using space-charge-limited current, J APPL PHYS, 89(10), 2001, pp. 5747-5753
Authors:
Huang, QF
Yoon, SF",Rusli,"Yang, H
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Citation: Qf. Huang et al., Molybdenum-containing carbon films deposited using the screen grid technique in an electron cyclotron resonance chemical vapor deposition system, DIAM RELAT, 9(3-6), 2000, pp. 534-538
Authors:
Yoon, SF
Tan, KH",Rusli,"Ahn, J
Huang, QF
Citation: Sf. Yoon et al., Effect of microwave power on diamond-like carbon films deposited using electron cyclotron resonance chemical vapor deposition, DIAM RELAT, 9(12), 2000, pp. 2024-2030
Authors:
Rusli,"Yoon, SF
Yang, H
Ahn, J
Huang, QF
Zhang, Q
Guo, YP
Yang, CY
Yeo, EJ
Wee, ATS
Huan, ACH
Watt, F
Citation: Sf. Rusli,"yoon et al., Tungsten-carbon thin films deposited using screen grid technique in an electron cyclotron resonance chemical vapour deposition system, SURF COAT, 123(2-3), 2000, pp. 134-139
Authors:
Yoon, SF
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Ahn, J
Zhang, Q
Shi, X
Citation: Sf. Yoon et al., Characteristics of molybdenum-containing a-C : H films deposited using electron cyclotron resonance CVD, INT J MOD B, 14(2-3), 2000, pp. 309-314
Authors:
Huang, QF
Yoon, SF",Rusli,"Yang, H
Gan, B
Chew, K
Ahn, J
Citation: Qf. Huang et al., Conduction mechanism in molybdenum-containing diamond-like carbon deposited using electron cyclotron resonance chemical vapor deposition, J APPL PHYS, 88(7), 2000, pp. 4191-4195
Authors:
Rusli,"Yoon, SF
Huang, QF
Yang, H
Yu, MB
Ahn, J
Zhang, Q
Teo, EJ
Osipowicz, T
Watt, F
Citation: Sf. Rusli,"yoon et al., Investigation of molybdenum-carbon films (Mo-C : H) deposited using an electron cyclotron resonance chemical vapor deposition system, J APPL PHYS, 88(6), 2000, pp. 3699-3704