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Citation: Ck. Chen et al., Fabrication of self-aligned 90-nm fully depleted SOICMOS SLOTFETs, IEEE ELEC D, 22(7), 2001, pp. 345-347

Authors: Chen, CL Mathews, RH Burns, JA Wyatt, PW Yost, DR Chen, CK Fritze, M Knecht, JM Suntharalingam, V Soares, A Keast, CL

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