Authors: Yunogami, T Nojiri, K

Citation: T. Yunogami et K. Nojiri, Anisotropic etching of RuO2 and Ru with high aspect ratio for gigabit dynamic random access memory, J VAC SCI B, 18(4), 2000, pp. 1911-1914

Authors: Yunogami, T Kumihashi, T

Citation: T. Yunogami et T. Kumihashi, Sub-quarter-micron Pt etching technology using electron beam resist with round-head, JPN J A P 1, 37(12B), 1998, pp. 6934-6938