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EFFECTS OF ION-BEAM DEFECT ENGINEERING ON CARRIER CONCENTRATION PROFILES IN 50-KEV P-IMPLANTED SI(100)()
Authors:
ZHAO QT WANG ZL XU TB ZHU PR ZHOU JS
Citation:
Qt. Zhao et al., EFFECTS OF ION-BEAM DEFECT ENGINEERING ON CARRIER CONCENTRATION PROFILES IN 50-KEV P-IMPLANTED SI(100)(), Applied physics letters, 62(24), 1993, pp. 3183-3185
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