Citation: D. Neuschutz et al., SIMULATION OF CHEMICAL-VAPOR-DEPOSITION OF SIC FROM METHYLTRICHLOROSILANE IN A HOT-WALL REACTOR, Journal de physique. IV, 5(C5), 1995, pp. 253-260
Citation: D. Neuschutz et al., SIMULATION OF CHEMICAL-VAPOR-DEPOSITION OF SIC FROM METHYLTRICHLOROSILANE IN A HOT-WALL REACTOR, Journal de physique. IV, 5(C5), 1995, pp. 253-260