Authors: da Rosa, EBO Goncalves, S de Almeida, RMC Baumvol, IJR Stedile, FC

Citation: Ebo. Da Rosa et al., Ion beams as analytical tools in the thermal growth of ultrathin silicon oxide films, NUCL INST B, 175, 2001, pp. 762-766

Authors: Krug, C da Rosa, EBO de Almeida, RMC Morais, J Baumvol, IJR Salgado, TDM Stedile, FC

Citation: C. Krug et al., Comment on "Atomic transport and chemical stability during annealing of ultrathin Al2O3 films on Si" - Reply, PHYS REV L, 86(20), 2001, pp. 4714-4714

Authors: da Rosa, EBO Morais, J Pezzi, RP Miotti, L Baumvol, IJR

Citation: Ebo. Da Rosa et al., Annealing of ZrAlxOy ultrathin films on Si in a vacuum or in O-2, J ELCHEM SO, 148(12), 2001, pp. G695-G703

Authors: Morais, J da Rosa, EBO Pezzi, RP Miotti, L Baumvol, IJR

Citation: J. Morais et al., Composition, atomic transport, and chemical stability of ZrAlxOy ultrathinfilms deposited on Si(001), APPL PHYS L, 79(13), 2001, pp. 1998-2000

Authors: Morais, J da Rosa, EBO Miotti, L Pezzi, RP Baumvol, IJR Rotondaro, ALP Bevan, MJ Colombo, L

Citation: J. Morais et al., Stability of zirconium silicate films on Si under vacuum and O-2 annealing, APPL PHYS L, 78(17), 2001, pp. 2446-2448

Authors: Krug, C da Rosa, EBO de Almeida, RMC Morais, J Baumvol, IJR Salgado, TDM Stedile, FC

Citation: C. Krug et al., Atomic transport and chemical stability during annealing of ultrathin Al2O3 films on Si, PHYS REV L, 85(19), 2000, pp. 4120-4123