Authors: Viana, CE da Silva, ANR Morimoto, NI Bonnaud, O

Citation: Ce. Viana et al., Analysis of SiO2 thin films deposited by PECVD using an oxygen-TEOS-argon mixture, BRAZ J PHYS, 31(2), 2001, pp. 299-303

Authors: da Silva, ANR Morimoto, NI Bonnaud, O

Citation: Anr. Da Silva et al., Tetraethylorthosilicate SiO2 films deposited at a low temperature, MICROEL REL, 40(4-5), 2000, pp. 621-624