Ck. Hanish et Jw. Grizzle, AUTOMATED TUNING OF AN ELECTRON-CYCLOTRON-RESONANCE CAVITY TO A MICROWAVE-POWER SOURCE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(5), 1997, pp. 2717-2727
Citations number
15
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
One of the drawbacks to using an electron cyclotron resonance (ECR) pl
asma source in a production reactive ion etch tool is that, typically,
the matching of the source load to the microwave power generator must
be done manually, and hence is prone to error. This can lead to large
variability in the power delivered to the plasma, that in turn may ca
use inconsistent etch results. In addition, if the reflected power due
to mismatch between the generator and plasma is large enough, signifi
cant damage can be done to the equipment. This article documents an au
tomated method for matching an ECR cavity to a microwave power generat
or. The algorithm is demonstrated on a Wavemat ECR high density source
coupled to an AsTex S-1500i microwave power generator. (C) 1997 Ameri
can Vacuum Society.