Gf. Niu et al., DEFINITION OF EFFECTIVE CHANNEL-LENGTH (L-EFF) IN DEEP-SUBMICRON MOSFETS BASED ON NUMERICALLY SIMULATED SURFACE-POTENTIAL, Solid-state electronics, 41(9), 1997, pp. 1377-1382
A new definition of L-eff which agrees well with electrical measuremen
ts using the channel resistance method is proposed, based on numerical
ly simulated surface potential. Using the L-eff definition, the physic
s underlying the fact that L-eff can be considerably longer than the m
etallurgical channel length L-eff is explored, and the independence of
L-eff On substrate bias V-sub is clarified. The gate bias dependence
of L-eff in LDD MOSFET is clearly reflected by the proposed L-eff defi
nition. (C) 1997 Elsevier Science Ltd.