DEFINITION OF EFFECTIVE CHANNEL-LENGTH (L-EFF) IN DEEP-SUBMICRON MOSFETS BASED ON NUMERICALLY SIMULATED SURFACE-POTENTIAL

Citation
Gf. Niu et al., DEFINITION OF EFFECTIVE CHANNEL-LENGTH (L-EFF) IN DEEP-SUBMICRON MOSFETS BASED ON NUMERICALLY SIMULATED SURFACE-POTENTIAL, Solid-state electronics, 41(9), 1997, pp. 1377-1382
Citations number
9
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied","Physics, Condensed Matter
Journal title
ISSN journal
00381101
Volume
41
Issue
9
Year of publication
1997
Pages
1377 - 1382
Database
ISI
SICI code
0038-1101(1997)41:9<1377:DOEC(I>2.0.ZU;2-X
Abstract
A new definition of L-eff which agrees well with electrical measuremen ts using the channel resistance method is proposed, based on numerical ly simulated surface potential. Using the L-eff definition, the physic s underlying the fact that L-eff can be considerably longer than the m etallurgical channel length L-eff is explored, and the independence of L-eff On substrate bias V-sub is clarified. The gate bias dependence of L-eff in LDD MOSFET is clearly reflected by the proposed L-eff defi nition. (C) 1997 Elsevier Science Ltd.