H. Lakner et al., CHARACTERIZATION OF MOVPE-GROWN (AL,IN,GA)N HETEROSTRUCTURES BY QUANTITATIVE ANALYTICAL ELECTRON-MICROSCOPY, Journal of electronic materials, 26(10), 1997, pp. 1103-1108
The low pressure metalorganic vapor phase epitaxy growth of wurzite (A
l, In, Ga)N heterostructures on sapphire substrates is investigated by
quantitative analytical scanning transmission electron microscopy tec
hniques like atomic number (Z-) contrast imaging and convergent beam e
lectron diffraction (CBED). Especially (In, Ca)N quantum wells of diff
erent thicknesses as well as superlattices were analyzed with respect
to defects, chemical composition variations, interface abruptness and
strain (relaxation) effects. The interfaces in In0.12Ga0.88N/GaN quant
um wells appear to be asymmetric. Additionally, we found composition v
ariations of Delta x(In) greater than or equal to 0.03 within the InGa
N quantum wells. The application of electron diffraction techniques (C
BED) yields quantitative information on strain and relaxation effects.
For the case of 17 nm thick InGaN quantum wells, we observed relaxati
on effects which are not present in the investigated thin quantum well
s of 2 nm thickness. The experimentally obtained diffraction patterns
were compared to simulations in order to get values for strain within
the quantum wells. Additionally, the influence of dislocations on the
digression of superlattices is investigated.