FORMATION OF GAASP INTERFACE LAYERS MONITORED BY REFLECTANCE ANISOTROPY SPECTROSCOPY

Citation
P. Kurpas et al., FORMATION OF GAASP INTERFACE LAYERS MONITORED BY REFLECTANCE ANISOTROPY SPECTROSCOPY, Journal of electronic materials, 26(10), 1997, pp. 1159-1163
Citations number
11
Categorie Soggetti
Engineering, Eletrical & Electronic","Material Science
ISSN journal
03615235
Volume
26
Issue
10
Year of publication
1997
Pages
1159 - 1163
Database
ISI
SICI code
0361-5235(1997)26:10<1159:FOGILM>2.0.ZU;2-4
Abstract
Reflectance anisotropy spectroscopy (RAS) has been used to study As-by -P exchange during metalorganic vapor phase epitaxy. The study focuses on the processes occurring during switching from GaAs to GaInP, espec ially the effect of purging PH3 over a GaAs surface. GaAsP/GaAs superl attices of different periodicity were grown and the P-content was dete rmined by high-resolution xray diffraction and correlated to the RAS s pectra. From the temperature dependence of the P-content, an activatio n energy of 0.56 eV was estimated for the incorporation mechanism. In addition to the insights into the processes at mixed group-V heteroint erfaces, our study demonstrates the reproducibility of RAS transients that thus can be used for process monitoring.