SURFACE SEGREGATION AND PREFERENTIAL SPUTTERING IN THIN AL-NI ALLOY-FILMS

Authors
STEFANOV P STANCHEV A
Citation
P. Stefanov et A. Stanchev, SURFACE SEGREGATION AND PREFERENTIAL SPUTTERING IN THIN AL-NI ALLOY-FILMS, Materials chemistry and physics, 50(3), 1997, pp. 209-212
Citations number
28
Categorie Soggetti
Material Science
Journal title
Materials chemistry and physics → ACNP
ISSN journal
02540584
Volume
50
Issue
3
Year of publication
1997
Pages
209 - 212
Database
ISI
SICI code
0254-0584(1997)50:3<209:SSAPSI>2.0.ZU;2-D
Abstract
The surface composition of AlxNi1-x alloy films was studied by X-ray e lectron spectroscopy (XPS) after various surface treatments and oxidat ion at room temperature. Ion etching caused a marked enrichment in Ni of the altered surface layer. After extensive sputtering, bombardment- induced segregation of Al at the outermost surface layer of the films was established. Al segregation to the surface was observed during ann ealing up to 1200 K. The interaction of oxygen with the surface of the alloy films caused surface segregation of Al, accompanied by preferen tial oxidation of Al. (C) 1997 Elsevier Science S.A.