Fs. Shieu et al., MICROSTRUCTURE, CHEMISTRY AND COATING PROPERTIES OF ION-PLATED TIN ONTYPE-304 STAINLESS-STEEL, Materials chemistry and physics, 50(3), 1997, pp. 248-255
Characterization of TiN coatings on type 303 stainless steel was carri
ed out using a Zeiss EM 902A energy filtering transmission electron mi
croscope equipped with an electron energy loss spectroscopy (EELS) det
ector. TiN thin films were produced by a hallow cathode discharge ion
plating coater. It was found by plan-view transmission electron micros
copy that the microstructure of the TiN coatings is thickness dependen
t. The grain size of TiN ranges from 88 nm at the coating surface down
to 9 nm near the TiN/steel interface. In addition, the TiN surface la
yer shows some degree of texture, but the subsurface and internal TiN
layers are mainly equiaxial and randomly oriented. Chemical analysis b
y EELS shows that the relative oxygen content increases linearly from
the TiN surface to the TiN/steel interface, whereas the relative nitro
gen content first decreases slowly and then drops rapidly near the int
erface. The presence of a Ti2N phase and the deficiency of nitrogen ne
ar the TiN/steel interface suggest that the early-deposited TiN is non
stoichiometric. By the periodic cracking method, the ultimate sheer st
ress at the TiN/steel interface and the residual stress in the TiN thi
n film were estimated to be 2.2 GPa and 12.8 GPa, respectively. (C) 19
97 Elsevier Science S.A.