ANALYTICAL NOISE MODEL WITH THE INFLUENCE OF SHOT-NOISE INDUCED BY THE GATE LEAKAGE CURRENT FOR SUBMICROMETER GATE-LENGTH HIGH-ELECTRON-MOBILITY TRANSISTORS
Ds. Shin et al., ANALYTICAL NOISE MODEL WITH THE INFLUENCE OF SHOT-NOISE INDUCED BY THE GATE LEAKAGE CURRENT FOR SUBMICROMETER GATE-LENGTH HIGH-ELECTRON-MOBILITY TRANSISTORS, I.E.E.E. transactions on electron devices, 44(11), 1997, pp. 1883-1887
A new high-frequency noise model which takes into account the influenc
e of shot noise induced by the gate leakage current is introduced; the
model accurately explains the observed minimum noise figure of submic
rometer gate-length HEMT's as a function of frequency. Based on the st
eady-state Nyquist theorem for multiterminal devices recently reported
[1], the minimum noise figure and the corresponding optimum source im
pedance of the microwave field effect transistors are expressed as fun
ctions of the measurable device parameters including noise spectral in
tensities and small-signal circuit parameters. The derived minimum noi
se figure can be shown to reduce to a simple form, i.e., an empirical
relation with two fitting constant. The simple form and the derived fo
rmulas for the optimum source impedance can explain very well the expe
rimental findings of the submicrometer gate-length high electron mobil
ity transistors over the extended microwave frequency range and also p
rovide the informations needed for the design of microwave low noise a
mplifiers.