DIAGNOSTIC-TECHNIQUE FOR PROJECTING GATE OXIDE RELIABILITY AND DEVICERELIABILITY

Citation
Jt. Park et al., DIAGNOSTIC-TECHNIQUE FOR PROJECTING GATE OXIDE RELIABILITY AND DEVICERELIABILITY, Microelectronics and reliability, 37(10-11), 1997, pp. 1421-1424
Citations number
5
Categorie Soggetti
Engineering, Eletrical & Electronic
ISSN journal
00262714
Volume
37
Issue
10-11
Year of publication
1997
Pages
1421 - 1424
Database
ISI
SICI code
0026-2714(1997)37:10-11<1421:DFPGOR>2.0.ZU;2-O
Abstract
This study presents a diagnostic technique for projecting gate oxide r eliability and device reliability from the correlation among four kind s of lifetime prediction methods which are experimentally characterize d by TDDB, F-N degradation, SILC and hot carrier degradation, It has b een found that there exists close correlation between gate oxide degra dation and device degradation. Therefore, this technique can be used t o evaluate how much the process induced degradation of gate oxide effe cts on the device degradation, (C) 1997 Published by Elsevier Science Ltd.