Jt. Park et al., DIAGNOSTIC-TECHNIQUE FOR PROJECTING GATE OXIDE RELIABILITY AND DEVICERELIABILITY, Microelectronics and reliability, 37(10-11), 1997, pp. 1421-1424
This study presents a diagnostic technique for projecting gate oxide r
eliability and device reliability from the correlation among four kind
s of lifetime prediction methods which are experimentally characterize
d by TDDB, F-N degradation, SILC and hot carrier degradation, It has b
een found that there exists close correlation between gate oxide degra
dation and device degradation. Therefore, this technique can be used t
o evaluate how much the process induced degradation of gate oxide effe
cts on the device degradation, (C) 1997 Published by Elsevier Science
Ltd.